Applications:
- Electron Microscopy:
SEM (secondary & backscattered electrons), TEM (for use with a bulk holder- the MRS-3 can be size altered to Ø 3mm x ½ mm thick).
Call for other sizes.
- Scanning Microscopies and Profilometry:
STM, AFM, stylus and optical etc. The pattern height is 0.1μm.
- Optical Microscopy:
transmitted, reflected, bright/dark field, differential contrast, and confocal.
- Chemical mapping:
EDS, WDS, micro/macro XRF, XPS, Auger & others. The pattern is fabricated using 0.1μm CrO2 over quartz.
- Particle Size Counting:
series of circles, squares & rectangles for calibration confirmation.
Pattern Design
The MRS-3 is fabricated using the high accuracy direct write electron beam manufacturing equipment. The pattern is anti-reflective chromium (30nm Cr2O over 70nm CR) on quartz. Imaging in both secondary and back scattered mode is very high. The pattern is coated with a proprietary conductive material which allows for SEM imaging at any accelerating voltage.
Geometric design
The MRS-3 has groups of nested squares with pitches of 2µm, 50µm and 500µm. The largest pattern has an overall dimension of 8mm square with lines and spaces of 250µm. This can be used to check magnifications between 10 - 100x, The 50µm pitch patterns are useful from 100 - 1000x magnifications.
The 2µm pitch allows calibrations up to 50,000x.
Dimensions/Retainers
The overall size of the MRS-3 is approx. 9 x 9 x 2.3mm. Since the standard is made on quartz, it easily chips.
We highly recommend ordering the optional protective retainers for the MRS-3 & MRS-4.
Retainers for the MRS-3 and MRS-4 help protect the standards from handling damage (please note these retainers are not for the MRS-5). If handling the MRS-3 and MRS-4 without a retainer the tweezer arms will contact the standard which is made from highly stressed fused silica. Small chips will occur working their way into the pattern compromising its usefulness. With the retainer tweezers contact the metal or the glass slide without touching the standard.
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MRS-3 brochure