Application Fine Vacuum
As base unit for our vacuum coating system the CCU-010 LV is designed for routine high quality sputter and/or carbon coatings for SEM and EDX. The modular concept allows for the subsequent conversion to a high vacuum coating system.
A Smart Device
A Sputter coater and/or carbon coater with options for plasma treatment within one device? Yes, this is possible with our table top vacuum coating system. By simply changing the process head, you can easily configure the unit for all these applications. Adjust the unit to your requirements or extend the functionality afterwards. A coating thickness monitor close to the sample is standard fitting which will precisely monitor and control film thickness of carbon and metal films.
Do Not Waste Time
The use of high-quality materials and components in combination with innovative ideas produces extraordinarily short process times. Create recipes via the modern user interface and use the automatic mode for reliable and reproducible production of thin coatings.
Low Consumption
The efficient gas control optimized for high vacuum reduces the consumption of your process gas. With a target diameter of 54 mm and high target utilization, you save money on consumables.
Compact and Practical
Save valuable laboratory space thanks to small dimensions. Weight has been minimized to reduce transport costs. Standardised small-flange quick connections ( ISO-KF ) act as interfaces with your connections.
Easy Start-up and Servicing
Unpack, connect, start! Do away with high start-up costs. The plug-and-play concept allows you to start up the device yourself. You only need to connect the power supply and the process gas. The service technician can run a quick error analysis thanks to the integrated USB service interface. The modular set-up allows for the targeted replacement of defective components.
Dimensions (L x W x H) | 570 x 360 x 350 mm |
Weight | 22 kg |
Glass cylinder | Ø 120 mm (DN 100 ISO-KF compatible) |
Imposion guard | Plastic splinter shield around glass receptacle |
Targets | Ø 54 mm and thickness up to 3 mm |
Coating time | 0.5 … 990 s |
Coating current | 10 … 100 mA |
Final vacuum | < 5 · 10–3 mbar (with backing pump Pascal 2005 SD) |
Vacuum measuring system | Pirani measuring probe (measuring range up to 1 E-3 mbar) |
Display | 115 x 86 mm, TFT graphical display |
Sample table | Ø 80 mm, holds numerous sample plates Height adjustment 0 … 50 mm Tilt 0 … 45° |
Pump system | Ext. backing pump (option) |
Connections, electrical | Device plug C14, 90-260 VAC, 47..63 Hz, 500 W |
Connections, gas | Process gas: Ø 6 mm, venting gas : Ø 6 mm, plasma gas: Ø 6 mm |
Connections, backing pump | Mechanical: Flange connection DN 25 ISO-KF Electrical: Connector socket C13, secured with 10 A therm. Circuit breaker. |
Art. | Description | Unit | Price | Quantity | |
---|---|---|---|---|---|
100000 | CCU-010 LV (low vacuum) |
Each | p.o.r. |