292nm Pitch High Magnification, High Resolution
Precision holographic grating standard with high contrast and excellent edge definition
Period: |
292nm pitch nominal, one dimensional array. Accuracy is +/- 1%. Calibration certificate will give the actual pitch of the standard. |
Surface structure: |
Titanium lines on Silicon, 4x3mm dimensions. Line height (about 30nm) and line width (130nm) are not calibrated. |
Usability: |
The calibrated pattern covers the entire chip. There is sufficient usable area to make tens of thousands of measurements without reusing any areas contaminated or altered by previous scans. |
AFM: |
Use in contact, tapping and other modes with image sizes from 500nm to 20um. Mounted on a 12mm steel AFM disk. |
SEM, Auger, FIB: |
Can be used for a wide range of accelerating voltage (<1kV-30kV) and calibrates images from 5kX to 200kX. Can be supplied unmounted or mounted on an SEM stub of your choice. |
Certification: |
There is a version with a non-traceable manufacturer’s certificate stating average pitch, based on batch measurements |